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Etching Reagent For Copper. 13 Zeilen Immersion etching at 20 degrees Celsius. For etching copper copper alloys and copper-silver alloys. Chromic acid-hydro- 00s 10 to 15 percent 56ml. Etching Enhances the Contrast on Surfaces in Order to Visualize the Microstructure or Macrostructure.
25 ml 25 ml 25 ml 1 drop. In some cases the masking material is a photoresist. Etching Enhances the Contrast on Surfaces in Order to Visualize the Microstructure or Macrostructure. CrO3 HCl Distilled water. 1875 gram 245 ml. Metallographic etching reagents.
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Metallographic etching reagents. CrO3 HCl Distilled water. The following materials were used. For many etch steps part of the wafer is protected from the etchant by a masking material which resists etching. For most aluminum and aluminum alloys. A microetching agent for copper and copper alloy is prepared from the aqueous solution of oxidant containing copper and contains high-molecular compound with polyamide chain andor cational group.